MAPPER Lithography




MAPPER Lithography Content

  • Electron source delivering > 100 mA of current, operated at 5 kV
  • Massively parallel electron optics
  • Sub-nm accuracy wafer stage under interferometer control
  • Availability of both 300mm and 200mm platform
  • No dedicated electro-magnetic environment is required
  • Data format is an open source OASIS.MAPPER format based on the OASIS standard
  • Mix-and-match capability with optical lithography and other electron beam machines
  • Modular design to provide flexible production capacity
  • The system complies with the required standards and directives (such as SEMI standards and other machine directives)

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