MAPPER Lithography




MAPPER Lithography Content

The system offers significant benefits for IC manufacturers and design companies that want to extend the design and manufacturing capabilities of their business. The benefits include:

  • Lithography at advanced technology nodes, 40 nm, 28 nm, 20 nm and beyond
  • Significant throughput performance on 300mm wafers
  • No masks are required, saving the cost of (immersion) masks
  • Electron beam lithography can be integrated in a standard CMOS flow in existing fabs
  • Electron beam technology is specifically suited for printing 2D, random structures (i.e. contact, via layers and cutting patterns).
  • Significant reduction of investment risk and financial hurdle
  • A faster time-to-market for new designs

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