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MAPPER en Technolution continueren partnerschap na nieuwe doorbraak e-beamtechnologie

Created on Tuesday, 03 April 2012 12:58

Gouda, 2 april 2012

 

In het testprogramma van de technologie voor elektronenlithografie van MAPPER Lithography is een nieuwe doorbraak bereikt in de resolutie waarmee wafers kunnen worden beschreven. MAPPER en Technolution continueren hun technologiealliantie voor de opschaling van de basistechnologie richting marktintroductie.

 

Technolution is betrokken bij de ontwikkeling van de Full Field Pattern Streamer (ffps) van de MATRIXmachine pre-production tool van MAPPER. Met een prototype-opstelling heeft Technolution laten zien dat het mogelijk is om alle realtime correcties op de data toe te passen. Alle ‘pixels’ die door de elektronenbundels worden ‘geprint’, zijn individueel aangepast aan de wafer die op dat moment belicht wordt en aan metingen die aan de machine zelf worden gedaan. De systeemverificatie is nu met succes afgerond, waarmee is aangetoond dat het ontwerp voldoet aan alle MAPPER- en klanteisen. Dit is een cruciale stap in de ontwikkeling van de e- beamtechnologie van MAPPER.

 

Opschalen naar 800 kanalen

 

Nu kan gestart worden met het opschalen van de basistechnologie voor de aansturing; van tientallen kanalen naar 800. Technolution is verantwoordelijk voor de levering van deze ‘800 kanaal Pattern Streamer’ systemen als onderdeel van het datapad van de MATRIX 1.1 machine die MAPPER in 2012 gaat realiseren.

 

Voorzetting technologiepartnerschap

 

Begin 2012 is overeenstemming bereikt tussen MAPPER en Technolution over de voortzetting van het technologiepartnerschap en zijn de werkpakketten tussen de beide ondernemingen vastgelegd. De specialisten van Technolution werken inmiddels ook aan een aantal projecten op andere gebieden ter ondersteuning van de realisatie van de e-beamtechnologie van MAPPER Lithography.

 

Technolution is in 2004 in opdracht van MAPPER gestart met het ontwikkelen van de technologie voor het Pattern Streamer Subsystem voor de e-beamdemonstratietool van MAPPER. Sinds 2008 is Technolution als technologiepartner van MAPPER betrokken bij de ontwikkeling van de Full Field Pattern Streamer.

 

Voor meer informatie kunt u de volgende websites bezoeken: www.technolution.eu en www.mapperlithography.com.

 

Tevens vindt u informatie in eerdere publicaties:

 

LETI-MAPPER IMAGINE programme: breakthrough achievements on MAPPER’s multibeam tool

Created on Monday, 13 February 2012 03:02
  • Demonstrated resolution meets the industry requirement for the next generation 14 nm and 10 nm Logic technology nodes
  • Continuation of IMAGINE programme by installing one of MAPPER’s first Matrix pre-production tool

 

Grenoble, France/Delft, The Netherlands, February 12, 2012 - CEA-Leti, the French Research and Technology Institute, reports significant progress on the capabilities of the massively parallel direct write technology developed by Delft, The Netherlands based MAPPER Lithography. The major achievement has been obtained in resolution: 22nm dense lines and spaces and 22 nm dense contact holes in positive chemically amplified resist have been successfully resolved. This demonstrated resolution also meets the industry requirement for the next generation 14 nm and 10 nm Logic technology nodes. The reported progress is the outcome of the 5th Operational Review of the IMAGINE program hosted by CEA-Leti January 24th – 26th. Furthermore CEA-Leti and Mapper announce the three year continuation of the IMAGINE programme through the future installation at CEA-Leti of one of MAPPER’s first pre-production Matrix systems, offering global players to assess maskless lithography technology in a real manufacturing environment.

 

The industry/research multi-partner program IMAGINE is an initially three-year project led by CEA-Leti, and includes leading semiconductor manufacturers TSMC and STMicroelectronics. More than 50 representatives from 13 different companies participating in the IMAGINE project, attended the Operation Review event. In this event CEA-Leti reported latest achievements obtained on MAPPER’s pre-alpha platform installed in its cleanroom since mid-2009, including a stitching demonstration.

 

“This result represents a state-of-the-art demonstration obtained thanks to the collaboration between partners. It demonstrates the capability of this technology that represents a real alternative for advanced semiconductor manufacturing” comments Laurent Pain, coordinator of the IMAGINE program and manager of the CEA-Leti lithography laboratory.

 

Bert Jan Kampherbeek, MAPPER’s CEO says:”This breakthrough marks another important step towards the introduction of our innovative tool for semiconductor manufacturing. In 2012 MAPPER will complete its Matrix pre-production platform with initially a 1 wafer per hour throughput capability and scalable to 10 wafers per hour. Given the great results we have obtained at CEA-Leti thus far, we are proud to announce that one of the first Matrix systems will be installed at CEA-Leti to enable the continuation of the IMAGINE programme.”

 

Laurent Malier, CEA-Leti CEO says: “The outcomes of IMAGINE reflect the involvement of CEA-Leti to push and promote this very promising lithography solution. We are already preparing the future together with MAPPER with the arrival of the first pre-production tool in our premise. By continuing the IMAGINE program for another three years, we will continue to answer to the increasing interest showed by industry”

 

22nm L/S

22nm Contact hole

 

 

 

 

 

 

 

 

 

 

 

About the IMAGINE programme


The IMAGINE project is an initially three-year project led by CEA-Leti, evaluating a maskless lithography infrastructure and the use of MAPPER Lithography tools for high throughput. The multiple e-beam-lithography program covers a global approach to the technology, including tool assessment, patterning and process integration, data handling, prototyping and cost analysis. The MAPPER platform is the core technology on which the IMAGINE program is built. This program provides the world’s major chip manufacturers with the opportunity to assess maskless lithography technology in a real manufacturing environment. In addition, it will develop and qualify the complete infrastructure, from data preparation to process integration, in preparation for its industrial introduction.
Participants in the IMAGINE project include leading semiconductor manufacturers TSMC and STMicroelectronics and a number of technical solutions suppliers like Nissan Chemical, TOK, Dow, JSR Micro, Synopsys, Mentor Graphics, Sokudo, Tel and Aselta.

 

About CEA-Leti


Leti is an institute of CEA, a French research-and-technology organization with activities in energy, IT, healthcare, defence and security. Leti is focused on creating value and innovation through technology transfer to its industrial partners. It specializes in nanotechnologies and their applications, from wireless devices and systems, to biology, healthcare and photonics. NEMS and MEMS are at the core of its activities. An anchor of the MINATEC campus, CEA-Leti operates 8,000-m² of state-of-the-art clean room space on 200mm and 300mm wafer platforms. It employs 1,400 scientists and engineers and hosts more than 190 Ph.D. students and 200 assignees from partner companies. CEA-Leti owns more than 1,700 patent families. For more information, visit www.leti.fr.

 

About MAPPER Lithography


MAPPER Lithography, based in Delft, The Netherlands, near Delft University of Technology, develops a ground breaking maskless lithography infrastructure for the semi conductor industry. These tools utilize an innovative multiple e-beam technology, with which next generation semi-conductors can be manufactured in a more cost effective fashion. It makes the tradionally used mask redundant and combines high resolution and high productivity. MAPPER has a headcount of 190.

 

CEA-Leti


Thierry Bosc
+33 4 38 78 31 95
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CEA-Leti


Serge Tedesco - Lithography program manager
+33 4 38 78 49 89
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MAPPER Lithography


Bert Jan Kampherbeek, CEO
Tel +31 15888 0250

 

 

Weber Shandwick


Eric Chauvelot/Robert Ba
+33 1 47 59 56 57 / 38 75
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