JSR Micro Joins CEA-Leti in Project to Develop Sub-20nm Next-Generation Lithography Materials and Processes

Created on Wednesday, 19 October 2011 15:46

Grenoble, France, October 19, 2011

JSR Micro and CEA-Leti announced that JSR will partner with CEA-Leti to develop sub-20nm next- generation lithography materials and processes.

The program will focus on pitch division to further extend 193nm optical lithography for logic applications below the 20nm node and on direct-write lithography, a maskless lithography (ML2) technology.

The specific ML2 development will be part of the IMAGINE program, a three-year project led by CEA-Leti that also includes semiconductor manufacturers TSMC and STMicroelectronics. It is developing a maskless lithography infrastructure and the use of MAPPER Lithography tools for high throughput.

One of JSR’s key focus areas is to enable sub-20nm technology development with a strong focus on next-generation lithography.

“JSR has a good understanding on what our customers need in terms of materials innovation, product performance, continuous quality and cost requirements and manufacturing,” said Bruno Roland, President of JSR Micro. “The collaboration with CEA-Leti is therefore a great opportunity to join a large and ambitious program, and participate in challenging new lithography developments with realistic market targets. In addition to extending optical lithography, this collaboration gives us an unique opportunity to contribute to the development of ML2.”

““The development of materials and processes is one of the main challenges facing lithography at the sub-20nm range,” said Serge Tedesco, CEA-Leti program manager. “Pushing standard optical lithography in combination with new techniques, as maskless lithography, seems a real alternative and we are very excited to be supported by JSR in exploring these new areas.”

About JSR

JSR Micro N.V., based in Leuven, Belgium, is a subsidiary of JSR Corporation, a multinational company employing over 5000 people worldwide and a leading materials supplier in a variety of technology driven markets. JSR’s global network is headquartered in Tokyo (Japan) and has factories and offices in Europe, US, China, Taiwan, Korea and Singapore. JSR is a research-oriented organization that pursues close collaborations with leading innovators in a number of industries that are key to the present and future welfare of human society: life-sciences, energy storage, electronic materials, display and optical materials. ‘Innovation one-on-one’ summarizes our value proposition to our customers. Through a very early and close collaboration JSR offers its customers a competitive advantage based on leading-edge technologies, consistent high quality and balanced cost of ownership.

Contacts

JSR:
Bruno Roland
+32 16 832 832
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CEA-Leti:
Serge Tedesco
+33 4 38 78 49 89
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Thierry Bosc
+33 4 38 78 31 95
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Agency :
Amélie Ravier
+33 1 58 18 59 30
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Synopsys Joins CEA-Leti’s IMAGINE Program on Maskless Lithography

Created on Monday, 19 September 2011 15:37

Grenoble, France, September 19, 2011

Leading Software Provider Is 10th Industrial Partner to Join IMAGINE

CEA-Leti today announced that Synopsys, Inc., a world leader in software and IP used in the design, verification and manufacture of electronic components and systems, has joined the IMAGINE program designed to develop maskless lithography for IC manufacturing. Synopsys is the 10th industrial partner to join IMAGINE.

CEA-Leti and MAPPER Lithography launched the program in July 2009 with the delivery of MAPPER’s Massively Parallel Electron Beam Platform to Leti.

The MAPPER platform is the core technology on which the IMAGINE program is built. This program provides the world’s major chip manufacturers with the opportunity to assess maskless lithography technology in a real manufacturing environment. In addition, it will develop and qualify the complete infrastructure, from data preparation to process integration, in preparation for its industrial introduction in 2015.

“Maskless lithography has emerged as a contender for extending IC manufacturing to technology nodes below 15 nanometers. The IMAGINE program brings together leaders from all areas of IC manufacturing in the assessment and deployment of this technology,” said Fabio Angelillis, vice president engineering of the Silicon Engineering Group at Synopsys. “Synopsys is pleased to contribute its technology leadership in mask tools, including mask synthesis and mask data preparation, to help drive effective software solutions for the IMAGINE program.”

“One of the key points for the ML2 technology is the ability to handle very large data files, and we will need to quickly establish the proper data format standard,” said Serge Tedesco, CEA-Leti program manager. “Having Synopsys’ extensive experience in helping define data format and solutions to related issues will be essential to our success.”

Contact

Serge Tedesco
+ 33 4 38 78 49 89
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Mentor Graphics is fifth industrial partner in CEA-Leti’s IMAGINE program on maskless lithography

Created on Tuesday, 15 March 2011 14:59

Grenoble, France, March 15, 2011

Mentor will develop multi e-Beam lithography data processing for 3-year project

CEA-Leti announced that Mentor Graphics is the fifth industrial partner to join the IMAGINE program designed to develop maskless lithography for IC manufacturing.

Launched by CEA-Leti and MAPPER Lithography, the three-year, multiple e-beam-lithography partnership is evaluating a maskless lithography (ML2) infrastructure and studying the use of MAPPER tools for high throughput. It covers a global approach to the technology, including tool assessment, patterning and process integration, data handling, prototyping and cost analysis.

Mentor will develop multiple e-beam lithography data processing for the program.
“Multi-beam systems for maskless lithography are contenders for next-generation patterning. The IMAGINE program is offering a unique infrastructure to enable this technology and we want to be an early partner in this research,” said Joseph Sawicki, vice president and general manager of Mentor’s Design to Silicon Division.“Our broad technology base and experience as the leader in optical proximity correction (OPC) and mask process correction (MPC) will provide technical components needed to make sure the data-path technology is ready for production deployment.”

“Data handling and proximity effect correction are key elements to the success of maskless technology,” said Serge Tedesco, CEA-Leti program manager. “Having Mentor Graphics, the worldwide leader in mask data processing, will accelerate the IMAGINE program’s progress toward the introduction of maskless lithography in manufacturing.”

Other partners include TSMC, STMicroelectronics, SOKUDO and TOK. MAPPER, which makes maskless-lithography machines for the semiconductor industry, is supporting the project with its massively parallel electron-beam platforms.

About Mentor Graphics Corporation

Mentor Graphics Corporation (NASDAQ: MENT) is a world leader in electronic hardware and software design solutions, providing products, consulting services and award-winning support for the world’s most successful electronics and semiconductor companies.
Established in 1981, the company reported revenues over the last 12 months of about $800 million. Corporate headquarters are located at 8005 S.W. Boeckman Road, Wilsonville, Oregon 97070-7777. World Wide Web site: http://www.mentor.com/..

Contact

Serge Tedesco
Phone: +33 4 38 78 49 89
Email: This e-mail address is being protected from spambots. You need JavaScript enabled to view it.