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LETI-MAPPER IMAGINE programme: breakthrough achievements on MAPPER’s multibeam tool 13 February 2012
JSR Micro Joins CEA-Leti in Project to Develop Sub-20nm Next-Generation Lithography Materials and Processes 19 October 2011
Synopsys Joins CEA-Leti’s IMAGINE Program on Maskless Lithography 19 September 2011
Mentor Graphics is fifth industrial partner in CEA-Leti’s IMAGINE program on maskless lithography 15 March 2011
SOKUDO joins CEA-Leti IMAGINE program to develop multiple E-Beam lithography process 20 September 2010
TSMC AND MAPPER REACHED JOINT DEVELOPMENT MILESTONE 19 February 2010
TOK joins CEA-Leti IMAGINE program to develop multiple E-Beam lithography sub-20nm resists and processes 19 February 2010
STMicroelectronics Joins CEA-Leti IMAGINE Program to Develop Multiple E-Beam Lithography 18 January 2010